Chip Design
Generate novel semiconductor device architectures and transistor geometries optimized for performance, power, and area trade-offs.

The Challenge
Semiconductor scaling is approaching fundamental physical limits — sub-3nm process nodes face quantum tunneling leakage, thermal management challenges, and lithographic constraints that make further miniaturization increasingly difficult. The industry needs architectural innovation — novel device geometries, material combinations, and circuit topologies that deliver performance gains without relying solely on dimensional scaling. The design space of possible device architectures is vast, spanning gate configurations, channel materials, contact schemes, and interconnect topologies, yet exploration is constrained by the enormous cost and time required for fabrication and characterization at advanced nodes.
Current semiconductor architecture exploration relies on TCAD simulation of proposed device structures, constrained by the geometries and material combinations that engineers conceive based on established device physics intuition. Generative design tools exist for digital circuit layout but not for the fundamental device architecture decisions — channel geometry, gate stack composition, source-drain engineering — that determine transistor-level performance. The creative design step remains entirely manual, limiting exploration to incremental extensions of known architectures like FinFET, GAA, and CFET.
The MatterSpace Approach
MatterSpace Tessera generates novel device architectures by navigating the joint space of geometry, materials, and doping profiles under performance-power-area constraints. Specify target metrics — drive current, leakage floor, switching energy, area budget — along with manufacturing node constraints, and Tessera constructs architectures satisfying all specifications with predicted electrical characteristics.
The Semiconductor Architecture domain pack encodes device physics, electrostatics, carrier transport models, and manufacturing design rules for advanced process nodes. Users define performance envelopes and Tessera generates candidate architectures with predicted I-V characteristics, parasitic profiles, and manufacturability assessments.
Specify what the output must satisfy. MatterSpace constructs candidates that meet all constraints simultaneously.
Every output satisfies physical laws, stability criteria, and domain constraints — no post-hoc filtering needed.
Powered by a domain-specific generation engine with physics-aware priors and adaptive dynamics control.
Generation Output
Key Differentiators
MatterSpace Tessera generates device architectures that are manufacturing-feasible by construction, enforcing design rules and process constraints during generation rather than filtering infeasible designs after the fact. The system explores architectural innovations beyond incremental modifications to known topologies, producing candidates with novel device physics that could not emerge from conventional TCAD parameter sweeps.
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Whether you are exploring semiconductor architecture for the first time or scaling an existing research programme, MatterSpace generates novel candidates that satisfy your constraints by construction.
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